SPIE Advanced Lithography + Patterning 2025

Date : 23rd February 2025 to 27th February 2025

Place : United States of America, San Jose

Website :https://spie.org/al_cfa

Contact Person:Customer Service

Description:

SPIE Advanced Lithography + Patterning is the leading global lithography event. Attend the meeting for optical lithography, metrology, or EUV.

SPIE Advanced Lithography + Patterning 2025 will be held in San Jose,United States of America on date 2025-02-27

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Deadline for abstracts/proposals : 14th August 2024

Keynote Speakers :

Conference Highlights :SPIE Advanced Lithography + Patterning
SPIE Advanced Lithography + Patterning: The conference for solving challenges in optical and EUV lithography, patterning technologies, metrology, and semiconductor manufacturing.

Join other leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications.#SPIElitho
ASML (The Netherlands)
Univ. of California, Los Angeles (UCLA) (United States)
IBM Research Frontiers Institute (Switzerland)
Taiwan Semiconductor Manufacturing Co. Ltd. (TSMC) (Taiwan)

Check the event website for more details.